Message #59 From:
NewsBot Date: February 26, 2007 08:04:00 AM
ENTG News Entegris Introduces Industry's First Comprehensive 193 nm Reticle Haze Prevention System for Semiconductor Manufacturers
CHASKA, Minn.--(BUSINESS WIRE)--Entegris Inc. (NASDAQ:ENTG) has introduced the industry’s first comprehensive solution to help semiconductor manufacturers address the quality and cost issues associated with reticle haze in 193 nm lithography.
“The cost of defects on reticles due to haze formation can be exorbitant, and it’s an acute problem in fabs with deep ultraviolet (DUV) lithography tools,” said Dave Ruede, director of product marketing for Entegris’ gas microcontamination business. “Up until now, the quest to control 193 nm reticle haze formation has been driven by trial and error with mixed results. Our new Clarilite Certified brand system, which in production fabs has been shown to extend reticle life by reducing the need for frequent reticle cleaning, demonstrates that a comprehensive system can help increase yield and significantly reduce reticle costs.”
Haze is formed when impurities deposit on a reticle due to the presence of airborne molecular contaminants and moisture in the reticle environment. To prevent haze, reticles must continuously reside in an extremely clean and dry environment from the moment they arrive at the production fab. The Clarilite Certified system provides a continuous cleansing environment for the reticle using chemically purified gas.
Bearing a special Clarilite Certified brand, the solution consists of Entegris technology, products and services engineered together to provide reticle haze prevention. This solution, which includes products and services for work-flow analysis, engineering, gas microcontamination, microenvironment control and testing, is available in a combination of flexible options designed to meet specific customer needs.
Entegris plans to expand its Clarilite Certified offerings to include new products and services that ensure reticles are maintained in a controlled environment throughout the reticle life cycle. In addition to its 193 nm reticle haze prevention solutions, Entegris also provides gas purifiers on lithography tools, airborne molecular contaminant control filters, and related products and services, to help keep the lithography area clean of contaminants.
The Clarilite Certified solution is the latest comprehensive offering from Entegris that demonstrates the company’s unique position in providing leading edge contamination control products and services, with local application expertise in close proximity to major semiconductor manufacturing sites.
For more information on Clarilite Certified and Entegris, please visit the Entegris exhibit #606 at the SPIE Advanced Lithography show, Feb. 27-28.
ABOUT ENTEGRIS
Entegris is the global leader in materials integrity management – delivering a wide range of products for purifying, protecting and transporting critical materials used in processing and manufacturing in semiconductor and other high tech industries. Entegris is ISO 9001 certified and has manufacturing, customer service or research facilities in the United States, China, France, Germany, Japan, Malaysia, Singapore, South Korea and Taiwan. Additional information can be found at www.entegris.com.
Clarilite Certified is a trademark and servicemark of Entegris Inc.
Entegris is a registered trademark of Entegris Inc.
