Message #51 From:
NewsBot Date: December 6, 2006 03:40:00 PM
ENTG News Entegris Introduces XCDA(R) Reticle Purge Gas Purification System to Improve Reticle Life in Deep UV Lithography
CHASKA, Minn.--(BUSINESS WIRE)--Entegris Inc. (NASDAQ:ENTG) introduces its Extreme Clean Dry Air (XCDA®)
gas purification system for use as a safer and more cost-effective
alternative to conventional nitrogen gas purging in reticle pods and
stockers. XCDA purified clean dry air is production-proven in hundreds
of scanner lens purge systems worldwide, is as chemically clean –
and about 40 percent less expensive than house nitrogen, and has none of
the asphyxiation risks associated with continuous nitrogen purge.
“Our XCDA reticle purge gas supply system
offers our customers a safer and more economical means of purging
critical mask storage environments with ultra high purity gas,”
said Devon Kinkead, vice president and general manager, gas
microcontamination, Entegris. “Our lithography
production-proven XCDA system is the perfect ultra-pure gas source to
extend reticle life, a major cost driver for our customers.”
The XCDA purification system has been production proven in hundreds of
photolithography systems since being introduced in 2000. The dual-bed,
self-regenerating design purifiers house clean dry air to maintain a
continuous flow of ultra-pure gas. Entegris recently reached an industry
milestone by surpassing its 300th installation.
For more information, please visit Entegris at exhibit # 2B-501 at
Semicon Japan, December 6-8.
ABOUT ENTEGRIS
Entegris is the global leader in materials integrity management –
delivering a wide range of products for purifying, protecting and
transporting critical materials used in processing and manufacturing in
semiconductor and other high tech industries. Entegris is ISO
9001-certified and has manufacturing, customer service or research
facilities in the United States, China, France, Germany, Japan,
Malaysia, Singapore, South Korea and Taiwan. Additional information can
be found at www.entegris.com.